| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2025 | 52 | WO/2025/194988 | COATING APPARATUS AND COATING METHOD | CN2025/072027 | C23C 14/22 | SUZHOU MAXWELL TECHNOLOGIES CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/194989 | COATING DEVICE AND METHOD THEREFOR | CN2025/072028 | C23C 14/35 | SUZHOU MAXWELL TECHNOLOGIES CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/240848 | LIGHT-DRIVEN COATING DEPOSITION METHODS AND USES THEREOF | US2025/029747 | C23C 16/02 | YALE UNIVERSITY | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/241346 | EVAPORATION BOAT, PREPARATION METHOD THEREFOR AND USE THEREOF | CN2024/115068 | C23C 14/24 | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/260379 | COATING DEVICE | CN2024/100801 | C23C 16/458 | LAPLACE RENEWABLE ENERGY TECHNOLOGY CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/260651 | METHOD AND APPARATUS FOR CORRECTING THICKNESS OF FILM LAYER, AND COMPUTER DEVICE | CN2024/139191 | C23C 14/24 | HYC (CHENGDU) TECHNOLOGY CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/261005 | THIN FILM DEPOSITION DEVICE AND THIN FILM DEPOSITION METHOD | CN2025/093998 | C23C 14/35 | ACM RESEARCH (SHANGHAI) , INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/261076 | DEPOSITION ASSEMBLY AND MANUFACTURING METHOD THEREFOR | CN2025/096612 | C23C 14/24 | BOE TECHNOLOGY GROUP CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/261199 | PROCESS CHAMBER AND SEMICONDUCTOR PROCESS DEVICE | CN2025/099865 | C23C 16/44 | BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/261214 | UPPER ELECTRODE DEVICE AND MAGNETRON SPUTTERING APPARATUS | CN2025/100066 | C23C 14/35 | BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/261344 | CR-TI-N ALLOY MATERIAL, CR-TI-N ALLOY FILM, CR-TI-N ALLOY COATING, ALLOY FILM PRODUCT, AND USE | CN2025/101465 | C23C 14/06 | VITALINK TECHNOLOGY CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/261371 | LARGE-AREA PRINTING AND TRANSFERRING METHOD FOR TWO-DIMENSIONAL MATERIAL MICRO-PATTERN ARRAY | CN2025/101594 | C23C 16/01 | ZHEJIANG UNIVERSITY | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/261656 | MOLA SPUTTERING TARGET | EP2025/062832 | C23C 14/34 | PLANSEE SE | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/262335 | METHOD AND DEVICE FOR THREE-DIMENSIONALLY COATING A POROUS MATERIAL | EP2025/067609 | C23C 14/04 | VOESTALPINE STAHL GMBH | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/262393 | METHOD FOR ALUMINISING A SUBSTRATE COMPRISING NICKEL | FR2025/050548 | C23C 10/28 | SAFRAN HELICOPTER ENGINES | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/263264 | TITANIUM MATERIAL, PROCESSED ARTICLE, AND PRODUCT | JP2025/019597 | C23C 8/24 | NIPPON STEEL CORPORATION | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/263283 | VAPOR DEPOSITION MASK AND METHOD FOR PRODUCING ELECTRONIC DEVICE | JP2025/019839 | C23C 14/04 | TOPPAN HOLDINGS INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/263336 | LAMINATED STRUCTURE AND ELECTRONIC DEVICE | JP2025/020369 | C23C 14/06 | GAIANIXX INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/263344 | FILM, ARTICLE, AND PLASMA PROCESSING DEVICE | JP2025/020517 | C23C 16/30 | TOKYO ELECTRON LIMITED | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/263394 | SUBSTRATE FOR ELECTROLESS PLATING, ELECTROLESS PLATING STRUCTURE, AND ELECTROLESS PLATING METHOD | JP2025/020944 | C23C 18/18 | EEJA LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/263395 | SUBSTRATE FOR ELECTROLESS PLATING, ELECTROLESS PLATED STRUCTURE, AND ELECTROLESS PLATING METHOD | JP2025/020945 | C23C 18/18 | EEJA LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/263407 | CONTROL VALVE CONTROL METHOD AND SUBSTRATE PROCESSING DEVICE | JP2025/021054 | C23C 16/52 | TOKYO ELECTRON LIMITED | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/263684 | METHOD FOR PRODUCING ELECTROLESS NICKEL-PLATED COMPONENT ASSEMBLY AND ELECTROLESS NICKEL-PLATED COMPONENT ASSEMBLY PRODUCED THEREBY | KR2024/014910 | C23C 18/16 | YKMC, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/263685 | METHOD FOR MANUFACTURING ELECTROLESS NICKEL-PLATED COMPONENT AND ELECTROLESS NICKEL-PLATED COMPONENT MANUFACTURED THEREBY | KR2024/014913 | C23C 18/16 | YKMC, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 52 | WO/2025/264711 | MOLYBDENUM DEPOSITION | US2025/034029 | C23C 16/04 | LAM RESEARCH CORPORATION | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی |